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18.05.2024 | Metals & corrosion

Substrate-dependent structural evolution during the oxidation of SiN_x thin films

verfasst von: Gowun Jung, Sehun Kim, Jiho Eom, In Young Song, Jinhee Lee, Seong-Keun Cho, Wang-Eun Lee, Kyuyoung Heo, Tae-Yeon Cho, Hwanhui Yun

Erschienen in: Journal of Materials Science

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Abstract

SiN_x thin films have garnered attention as promising barrier films, primarily due to their low impurity diffusion rates, making them suitable for various technological applications. Despite their potential, these films face challenges because they are prone to degradation in hostile environments. This study investigated the oxidation behavior of SiN_x thin films, particularly when deposited on two different types of substrates: rigid silicon (Si) and flexible polyethylene terephthalate (PET) films. A thorough microstructural analysis of the SiN_x films reveals their detailed morphological and compositional characteristics, enabling a comparison between the SiN_x/Si and SiN_x/PET films. This study further investigates the impacts of high-temperature and humidity exposure on SiN_x thin films, systematically elucidating the degradation behaviors and underlying mechanisms. The structural evolution during SiN_x film oxidation is illustrated at the nanoscale, and the factors contributing to the oxidation were analyzed. This study deepens our understanding of the interplay between oxidation processes and the unique environmental conditions of substrates, offering insights into enhancing the stability and reliability of these materials.

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Titel: Substrate-dependent structural evolution during the oxidation of SiNx thin films
verfasst von: Gowun Jung
Sehun Kim
Jiho Eom
In Young Song
Jinhee Lee
Seong-Keun Cho
Wang-Eun Lee
Kyuyoung Heo
Tae-Yeon Cho
Hwanhui Yun
Publikationsdatum: 18.05.2024
Verlag: Springer US
Erschienen in: Journal of Materials Science
Print ISSN: 0022-2461
Elektronische ISSN: 1573-4803
DOI: https://doi.org/10.1007/s10853-024-09751-w

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